Sputtering Target
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Cr Sputtering Target
Manufacturing Process: Hot Isostatic Pressing
Specification : Length: <4000mm, OD:<300mm
Relative Density > 99.0%
Purity : 99.5% ~ 99.8%
Grain Size <50 um
Ti Sputtering Target
Manufacturing Process: Vacuum melting technology
Specification : Length: <4000mm, OD:<300mm
Purity : 99.7% ~ 99.999%
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Al and Cu Sputtering Target
Manufacturing Process: Vacuum melting technology
Specification : Length: <4000mm, OD:<300mm
Purity : 99.99% ~ 99.999%
Other materials
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